Purity:W≥99.95%
Density: ≥19.0g/cm3
Flatness: ≤2%
Standard: GB/T3875-83 or ASTM B 760-86
Suitable for producing ion implantation parts
For producing electric light source parts,components of electric vacuum
For producing W-boats,heat shield and heat bodies in high temperature furnace
Used for tungsten sputtering target used in reflection shield, cover plate applied in the sapphire growth furnace
Thickness | Thickness Tolerance | Width | Width Tolerance | Length | Length Tolerance | Delivery Condition |
---|---|---|---|---|---|---|
0.1 | ±0.02 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.2 | ±0.03 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.3 | ±0.04 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.4 | ±0.05 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.5 | ±0.06 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.6 | ±0.07 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.7 | ±0.08 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.8 | ±0.08 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
0.9 | ±0.08 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
1.0 | ±0.12 | 10-250 | ±2 | 500 | ±2 | Cold rolled |
1.5 | ±0.12 | 10-250 | ±2 | 500 | ±2 | Cold rolled |